Band offsets at semiconductor-oxide interfaces from hybrid density-functional calculations

Band offsets at semiconductor-oxide interfaces are determined through a scheme based on hybrid density functionals, which incorporate a fraction alpha of Hartree-Fock exchange. For each bulk component, the fraction alpha is tuned to reproduce the experimental band gap, and the conduction and valence band edges are then located with respect to a reference level. The lineup of the bulk reference levels is determined through an interface calculation, and shown to be almost independent of the fraction alpha. Application of this scheme to the Si-SiO2, SiC-SiO2, and Si-HfO2 interfaces yields excellent agreement with experiment.

Published in:
Physical Review Letters, 101, 10, 106802
Other identifiers:

 Record created 2009-10-08, last modified 2018-03-17

Rate this document:

Rate this document:
(Not yet reviewed)