Comparison of two Metal Ion Implantation Techniques for Fabrication of Gold and Titanium Based Compliant Electrodes on Polydimethylsiloxane

This study contrasts the implantation of 25 μm thick Polydimethylsiloxane (PDMS) membranes with titanium and gold ions at 10 keV and 35 keV for doses from 1x10^15 at/cm2 to 2.5x10^16 at/cm2 implanted with two different techniques: Filtered Cathodic Vacuum Arc (FCVA) and Low Energy Broad Ion Beam (LEI). The influence of the ion energy, ion type, and implantation tool on the Young’s modulus (E), resistivity and structural properties (nanocluster size and location, surface roughness) of PDMS membranes is reported. At a dose of 2.5x10^16 at/cm2 and an energy of 10 keV, which for FCVA yields sheet resistance of less than 200 ohm/square, the initial value of E (0.85 MPa) increases much less for FCVA than for LEI. For gold we obtain E of 5 MPa (FCAV) compared to 86 MPa (LEI) and for titanium 0.94 MPa (FCVA) compared to 57 MPa (LEI). Resistivity measurements show better durability for LEI than for FCVA implanted samples and better time stability for gold than for titanium.

Published in:
Mater. Res. Soc. Symp. Proc, Vol. 1188, 1188-LL03-09
Presented at:
2009 MRS Spring Meeting, San Francisco, April 13 - 17, 2009

 Record created 2009-09-25, last modified 2018-03-17

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