000140422 001__ 140422
000140422 005__ 20180317094301.0
000140422 0247_ $$2doi$$a10.1117/12.781263
000140422 02470 $$2ISI$$a000257885600002
000140422 037__ $$aCONF
000140422 245__ $$aDual-wavelength digital holographic microscopy with sub-nanometer axial accuracy
000140422 269__ $$a2008
000140422 260__ $$bSPIE$$c2008
000140422 336__ $$aConference Papers
000140422 520__ $$aWe present dual-wavelength Digital Holographic Microscopy (DHM) measurements on a certified 8.9 nm high Chromium thin step sample and demonstrate sub-nanometer axial accuracy. We introduce a modified DHM Reference Calibrated Hologram (RCH) reconstruction algorithm taking into account amplitude contributions. By combining this with a temporal averaging procedure and a specific dual-wavelength DHM arrangement, it is shown that specimen topography can be measured with an accuracy, defined as the axial standard deviation, reduced to at least 0.9 nm. Indeed, it is reported that averaging each of the two wavefronts recorded with real-time dual-wavelength DHM can provide up to 30% spatial noise reduction for the given configuration, thanks to their non-correlated nature.
000140422 6531_ $$a[MVD]
000140422 700__ $$aKühn, Jonas
000140422 700__ $$0240472$$aCharrière, Florian$$g119924
000140422 700__ $$0240771$$aColomb, Tristan$$g100884
000140422 700__ $$0240770$$aMontfort, Frédéric$$g102739
000140422 700__ $$0240772$$aCuche, Etienne$$g104844
000140422 700__ $$aEmery, Yves
000140422 700__ $$aMarquet, Pierre
000140422 700__ $$0240009$$aDepeursinge, Christian$$g104931
000140422 7112_ $$aPhotonics Europe$$cStrasbourg$$dApril 7-11, 2008
000140422 773__ $$j6995$$tOptical Micro- and Nanometrology in Microsystems Technology II
000140422 8564_ $$uhttp://spie.org/x648.html?product_id=781263$$zURL
000140422 909CO $$ooai:infoscience.tind.io:140422$$pSTI$$pconf
000140422 909C0 $$0252008$$pLOA$$xU10346
000140422 937__ $$aLOA-CONF-2009-023
000140422 973__ $$aEPFL$$rNON-REVIEWED$$sPUBLISHED
000140422 980__ $$aCONF