Coated, light-transmitting or reflecting substrate, used as optical component or window, e.g. lens, mirror or windscreen, has (per)fluoroalkylsilane coating produced by plasma etching, hydration, drying and gas phase deposition
2002
Résumé
A method for the gas phase deposition of partially fluorinated or perfluorinated alkyl silanes onto a substrate in a reaction chamber includes cleaning the substrate, hydrating the substrate with steam, drying the substrate and silanization of the substrate by deposition of the alkyl silane from the gas phase. The cleaning of the substrate is a plasma etching process and the hydration occurs directly after the plasma etching.
Détails
Titre
Coated, light-transmitting or reflecting substrate, used as optical component or window, e.g. lens, mirror or windscreen, has (per)fluoroalkylsilane coating produced by plasma etching, hydration, drying and gas phase deposition
Auteur(s)
Hoffmann, Patrik ; Kulig, Gerit ; Barbieri, Laura
Date
2002
Editeur
SWISSOPTIC AG (SWIS-Non-standard) ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (ECOL-Non-standard)
Mots-clés (libres)
Note
Alternative title(s) :
(de) Gasphasenabscheidung von perfluorierten alkylsilanen
(fr) Depot en phase gazeuse d'alkylsilanes perfluores
(en) Gas phase deposition of perfluorinated alkyl silanes
Autres identifiant(s)
EPO Family ID: 32049440
Numéro(s) de brevet
US2005247120 (A1)
EP1554058 (A1)
AU2003282034 (A1)
WO2004037446 (A1)
DE10248775 (A1)
EP1554058 (A1)
AU2003282034 (A1)
WO2004037446 (A1)
DE10248775 (A1)
Le document apparaît dans
Production scientifique et compétences > STI - Faculté des sciences et techniques de l'ingénieur > STI Archives > LOA - Laboratoire d'optique appliquée Prof. Salathé
Production scientifique et compétences > Unités non-académiques > TTO - Office de transfert de technologies
Travail produit à l'EPFL
Brevets
Production scientifique et compétences > Unités non-académiques > TTO - Office de transfert de technologies
Travail produit à l'EPFL
Brevets
Date de création de la notice
2009-07-20