Effusing source for film deposition of reservoir, comprises hole having hole diameter less than one order of magnitude than mean free path of molecules


Year:
2002
Publisher:
ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (ECOL-Non-standard) BENVENUTI G (BENV-Individual) AMOROSI S (AMOR-Individual) HALARY-WAGNER E (HALA-Individual)
Keywords:
Other identifiers:
EPO Family ID: 29275950
Laboratories:




 Record created 2009-07-20, last modified 2018-03-17


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