Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate


Year:
2005
Publisher:
FEI CO (FEIF-Non-standard)
Keywords:
Other identifiers:
EPO Family ID: 36675948
Laboratories:




 Record created 2009-07-20, last modified 2018-09-13


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