Photopatterning at thick photoresist layers for MEMS applications.


Advisor(s):
de Rooij, N. F.
Year:
2000
Publisher:
Université de Neuchâtel
Note:
Jury: M. Koudelka-Hep (IMT–Uni-NE), J. Bergqvist (CSEM).
Laboratories:




 Record created 2009-05-12, last modified 2018-03-17


Rate this document:

Rate this document:
1
2
3
 
(Not yet reviewed)