Infoscience

Thesis

Photopatterning at thick photoresist layers for MEMS applications.

    Note:

    Jury: M. Koudelka-Hep (IMT–Uni-NE), J. Bergqvist (CSEM).

    Reference

    • SAMLAB-THESIS-2000-005

    Record created on 2009-05-12, modified on 2016-08-08

Fulltext

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