Microfabricated double layer octupoles for microcolumn applications

We report about a new process we have developed to fabricate miniaturized double layer octupoles that can be operated as electrostatic scanner/stigmators for charged particle beams. The fabrication process is based on deep reactive ion etching (DRIE) and anodic bonding. In order to use the octupoles in a microcolumn set-up, they have to be ultra-high vacuum (UHV) compatible. The microfabricated octupoles have been incorporated into our microcolumn test system to investigate the deflection quality on a low energy electron beam. The presented images demonstrate the fully functional operation of a double layer octupole as pre-lens deflector of a microcolumn.


Published in:
Microelectronic Engineering, 46, 1, 401-404
Year:
1999
ISSN:
01679317
Note:
215
Laboratories:




 Record created 2009-05-12, last modified 2018-09-13


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