Realization miniaturised low voltage electron beam system for lithography application.


Advisor(s):
de Rooij, N. F.
Year:
1997
Publisher:
Université de Neuchâtel
Note:
Jury: H.P. Herzig (IMT-UniNE), P. Vettiger (IBM ZH), P. Chang (IBM ZH), U. Staufer (Uni Bâle).
Laboratories:




 Record created 2009-05-12, last modified 2018-07-07


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