Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes
1998
Details
Title
Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes
Author(s)
Indermühle, P.-F. ; Roth, S. ; Dellmann, L. ; de Rooij, N. F.
Published in
Journal of Micromechanics and Microengineering
Volume
8
Issue
2
Pages
74-76
Date
1998
Note
190
Laboratories
SAMLAB
Record Appears in
Scientific production and competences > STI - School of Engineering > STI Archives > SAMLAB - Sensors, Actuators and Microsystems Laboratory
Peer-reviewed publications
Work outside EPFL
Journal Articles
Published
Peer-reviewed publications
Work outside EPFL
Journal Articles
Published
Record creation date
2009-05-12