Patterned Thick Photoresist Layers for Protection of Protruding Structures During Wet and Dry Etching Processes
1997
Details
Title
Patterned Thick Photoresist Layers for Protection of Protruding Structures During Wet and Dry Etching Processes
Author(s)
Indermühle, P.-F. ; Dellmann, L. ; Roth, S. ; de Rooij, N. F.
Published in
Micromechanics Europe '97
Pages
39-42
Date
1997
Laboratories
SAMLAB
Record Appears in
Scientific production and competences > STI - School of Engineering > STI Archives > SAMLAB - Sensors, Actuators and Microsystems Laboratory
Work outside EPFL
Conference Papers
Published
Work outside EPFL
Conference Papers
Published
Record creation date
2009-05-12