Title
Photoplastic Fabrication Techniques and Devices based on High Aspect Ratio Photoresist.
Date
2001
Publisher
Université de Neuchâtel
Note
Jury: P. Renaud (EPFL) F. Marquis-Weible (EPFL), F. Grey, Uni of Denmark), P. Vettiger, (IBM, ZH)
Record creation date
2009-05-12