Photoplastic Fabrication Techniques and Devices based on High Aspect Ratio Photoresist.


Advisor(s):
de Rooij, N. F.
Year:
2001
Publisher:
Université de Neuchâtel
Note:
Jury: P. Renaud (EPFL) F. Marquis-Weible (EPFL), F. Grey, Uni of Denmark), P. Vettiger, (IBM, ZH)
Laboratories:




 Record created 2009-05-12, last modified 2018-01-27

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