Ta2O5 and HfO2 as ion-sensitive materials in ISFETs
2005
Details
Title
Ta2O5 and HfO2 as ion-sensitive materials in ISFETs
Author(s)
Briand, D. ; van der Wal, P. D. ; Mondin, G. ; Jenny, S. ; Jeanneret, S. ; Millon, C. ; Roussel, H. ; Dubourdieu, C. ; de Rooij, N. F.
Published in
Nouveaux oxydes à forte permittivité dans l'intégration des semi-conducteurs
Pages
183-188
Date
2005
Laboratories
SAMLAB
Record Appears in
Scientific production and competences > STI - School of Engineering > STI Archives > SAMLAB - Sensors, Actuators and Microsystems Laboratory
Work outside EPFL
Conference Papers
Published
Work outside EPFL
Conference Papers
Published
Record creation date
2009-05-12