Thermal and Laser assisted TiO2-SiO2 graded index Ultra-high Vacuum Chemical Vapor Deposition (UHV-CVD)
2004
Details
Title
Thermal and Laser assisted TiO2-SiO2 graded index Ultra-high Vacuum Chemical Vapor Deposition (UHV-CVD)
Author(s)
Benvenuti, G. ; Banakh, O. ; Brioude, A. ; Gaillard, C. ; Hoffmann, P.
Conference
ICPEPA-4, Lecce, Italy, 6.09. - 9.09.2004
Date
2004
Keywords
Laboratories
LOA
Record Appears in
Scientific production and competences > STI - School of Engineering > STI Archives > LOA - Advanced Photonics Laboratory
Work produced at EPFL
Published
Posters
Work produced at EPFL
Published
Posters
Record creation date
2009-05-05