Details
Title
Multiple aperture imaging system for lithography
Author(s)
Völkel, R. ; Herzig, H. P. ; Dändliker, R.
Published in
17th Congress of the International Commission for Optics
Series
Proc. SPIE, 2778
Pages
9-10
Date
1996
Publisher
SPIE-The International Society for Optical Engineering, Bellingham, USA
Laboratories
OPT
Record Appears in
Scientific production and competences > STI - School of Engineering > STI Archives > OPT - Optics and Photonics Technology Laboratory
Work outside EPFL
Conference Papers
Published
Work outside EPFL
Conference Papers
Published
Record creation date
2009-04-22