Diffractive structures for testing nano-meter technology

We investigated two optical methods for characterizing submicron structures. Average errors of a few nanometers can be determined by the far-field diffraction metrology utilizing diffractive structures having enhanced sensitivity to fabrication errors. The scanning spot metrology is well suited for analyzing lithographic masks. © 1995 Elsevier Science B.V. All rights reserved.


Published in:
Microelectronic Eng., 27, 543-546
Year:
1995
Laboratories:




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