Diffractive structures for testing nano-meter technology
We investigated two optical methods for characterizing submicron structures. Average errors of a few nanometers can be determined by the far-field diffraction metrology utilizing diffractive structures having enhanced sensitivity to fabrication errors. The scanning spot metrology is well suited for analyzing lithographic masks. © 1995 Elsevier Science B.V. All rights reserved.
Record created on 2009-04-22, modified on 2016-08-08