Submonolayer nucleation and growth of copper on Ni(100)

Island densities and island sizes can be varied or even tailored by choice of external parameters in molecular beam epitaxy, i.e.: by the choice of substrate temperature. deposition rate, and coverage. We present a comprehensive study of the nucleation kinetics of Cu on Ni(100) using variable temperature scanning tunneling microscopy. The analysis of the saturation island density as a function of substrate temperature and deposition rate reveals that the smallest stable island abruptly changes from a dimer to a tetramer. The sizes of the critical nuclei are determined from the rate dependence of the saturation island density using mean-field nucleation theory consistent with results from the island size distribution using scaling theory. From the Arrhenius-plot, the microscopic quantities (migration barrier and dimer bond energy) have been deduced.


Published in:
Surface Diffusion, 360, 151-159
Year:
1997
ISSN:
0258-1221
ISBN:
0258-1221
Keywords:
Laboratories:




 Record created 2009-04-14, last modified 2018-03-17

n/a:
Download fulltext
PDF

Rate this document:

Rate this document:
1
2
3
 
(Not yet reviewed)