Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process
2008
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Title
Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process
Author(s)
Dumas, C. ; Grisolia, J. ; Carrey, J. ; Arbouet, A. ; Paillard, V. ; BenAssayag, G. ; Schamm, S. ; Bonafos, C. ; van den Boogaart, M.A.F. ; Savu, V. ; Brugger, J. ; Normand, P.
Published in
Materials and emerging technologies for non-volatile-memory devices
Conference
European Materials Research Society (EMRS 2008): Symposium H: Materials and emerging technologies for non-volatile-memory devices, Strasbourg, France, June 26-30 2008.
Date
2008
Laboratories
LMIS1
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS1 - Microsystems Laboratory 1
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Record creation date
2009-03-03