Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process


Published in:
Materials and emerging technologies for non-volatile-memory devices
Presented at:
European Materials Research Society (EMRS 2008): Symposium H: Materials and emerging technologies for non-volatile-memory devices, Strasbourg, France, June 26-30 2008.
Year:
2008
Laboratories:




 Record created 2009-03-03, last modified 2018-03-17

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