Direct fabrication of NIL stamps using Stencil Lithography
Villanueva, Luis Guillermo; Vazquez Mena, Oscar; Kiefer, Thomas; Brugger, Jürgen
2008
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Abstract

Stencil Lithography has been used for the rapid and low cost fabrication of high resolution NIL stamps. The stamps are fabricated by Al deposition through a nanoscale shadow mask and subsequent Si etching. Features down to 50 nm in the stamps have been achieved. The functionality of the stamps has been tested by fabricating Al nanowires down to 100 nm wide.

Details

Title Direct fabrication of NIL stamps using Stencil Lithography
Author(s) Villanueva, Luis Guillermo ; Vazquez Mena, Oscar ; Kiefer, Thomas ; Brugger, Jürgen
Published in Proceedings of Eurosensors XXII
Conference Eurosensors XXII, Dresden, Germany, September 7-10, 2008
Date 2008
Keywords
Laboratories LMIS1
NEMS
Record Appears in Scientific production and competences > STI - School of Engineering > IGM - Institute of Mechanical Engineering > NEMS - Advanced Nano-electromechanical Systems Laboratory
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS1 - Microsystems Laboratory 1
Peer-reviewed publications
Work produced at EPFL
Published
Posters
Record creation date 2009-03-02

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