Direct fabrication of NIL stamps using Stencil Lithography
Stencil Lithography has been used for the rapid and low cost fabrication of high resolution NIL stamps. The stamps are fabricated by Al deposition through a nanoscale shadow mask and subsequent Si etching. Features down to 50 nm in the stamps have been achieved. The functionality of the stamps has been tested by fabricating Al nanowires down to 100 nm wide.