Direct fabrication of NIL stamps using Stencil Lithography

Stencil Lithography has been used for the rapid and low cost fabrication of high resolution NIL stamps. The stamps are fabricated by Al deposition through a nanoscale shadow mask and subsequent Si etching. Features down to 50 nm in the stamps have been achieved. The functionality of the stamps has been tested by fabricating Al nanowires down to 100 nm wide.


Published in:
Proceedings of Eurosensors XXII
Presented at:
Eurosensors XXII, Dresden, Germany, September 7-10, 2008
Year:
2008
Keywords:
Laboratories:


Note: The status of this file is: EPFL only


 Record created 2009-03-02, last modified 2018-03-18

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