Rough ZnO Layers by LP-CVD Process and their Effect in Improving Performances of Amorphous and Microcrystalline Silicon Solar Cells

Doped ZnO layers deposited by low-pressure chemical vapour deposition technique have been studied for their use as transparent contact layers for thin-film silicon solar cells. Surface roughness of these ZnO layers is related to their light-scattering capability; this is shown to be of prime importance to enhance the current generation in thin-film silicon solar cells. Surface roughness has been tuned over a large range of values, by varying thickness and/or doping concentration of the ZnO layers. A method is proposed to optimize the light-scattering capacity of ZnO layers, and the incorporation of these layers as front transparent conductive oxides for p-i-n thin-film microcrystalline silicon solar cells is studied. © 2006 Elsevier B.V. All rights reserved.


Published in:
Solar Energy Materials and Solar Cells, 90, 18-19, 2960-2967
Year:
2006
ISSN:
09270248
Note:
IMT-NE Number: 392
Laboratories:


Note: The status of this file is: Involved Laboratories Only


 Record created 2009-02-10, last modified 2018-12-03

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