Influence of Excitation Frequency, Temperature and Hydrogen Dilution on the Stability of PECVD-Deposited a-Si:H
1998
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Title
Influence of Excitation Frequency, Temperature and Hydrogen Dilution on the Stability of PECVD-Deposited a-Si:H
Author(s)
Platz, R. ; Wagner, S. ; Hof, C. ; Shah, A. ; Wieder, S. ; Rech, B.
Published in
Journal of Applied Physics
Volume
84
Pages
3949-3953
Date
1998
Note
IMT-NE Number: 291
Laboratories
PV-LAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > PV-LAB - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work outside EPFL
Journal Articles
Published
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work outside EPFL
Journal Articles
Published
Record creation date
2009-02-10