Influence of Excitation Frequency, Temperature and Hydrogen Dilution on the Stability of PECVD-Deposited a-Si:H


Published in:
J. Appl. Phys., 84, 3949-3953
Year:
1998
Note:
IMT-NE Number: 291
Laboratories:




 Record created 2009-02-10, last modified 2018-09-13

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