Intrinsic Microcrystalline Silicon by Plasma-Enhanced Chemical Vapor Deposition from Chlorine-Containing Source Gas


Published in:
Journal of Vacuum Science & Technology A, 16, 3218-3222
Year:
1998
Note:
IMT-NE Number: 293
Laboratories:




 Record created 2009-02-10, last modified 2018-09-13

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