Intrinsic Microcrystalline Silicon by Plasma-Enhanced Chemical Vapor Deposition from Chlorine-Containing Source Gas
1998
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Details
Title
Intrinsic Microcrystalline Silicon by Plasma-Enhanced Chemical Vapor Deposition from Chlorine-Containing Source Gas
Author(s)
Platz, R. ; Wagner, S.
Published in
Journal of Vacuum Science & Technology A
Volume
16
Pages
3218-3222
Date
1998
Note
IMT-NE Number: 293
Laboratories
PV-LAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > PV-LAB - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work outside EPFL
Journal Articles
Published
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work outside EPFL
Journal Articles
Published
Record creation date
2009-02-10