Comparison of VHF, RF and DC Plasma Excitation for a-Si:H Deposition with Hydrogen Dilution
1998
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Details
Title
Comparison of VHF, RF and DC Plasma Excitation for a-Si:H Deposition with Hydrogen Dilution
Author(s)
Platz, R. ; Hof, C. ; Rech, B. ; Wieder, S. ; Payne, A. ; Wagner, S. ; Fischer, D. ; Shah, A.
Published in
MRS Proceedings
Volume
507
Pages
565-570
Date
1998
Note
IMT-NE Number: 277
Laboratories
PV-LAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > PV-LAB - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work outside EPFL
Conference Papers
Published
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work outside EPFL
Conference Papers
Published
Record creation date
2009-02-10