Device Grade Microcrystalline Silicon Owing to Reduced Oxygen Contamination


Published in:
Appl. Phys. Lett., 69, 1373-1375
Year:
1996
Note:
IMT-NE Number: 227
Laboratories:


Note: The status of this file is: Involved Laboratories Only


 Record created 2009-02-10, last modified 2018-09-13

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