Structural, Optical and Electrical Properties of
µc-Si:H very thin Films deposited by the VHF-GD Technique
1994
Details
Title
Structural, Optical and Electrical Properties of
µc-Si:H very thin Films deposited by the VHF-GD Technique
Author(s)
Flückiger, R. ; Meier, J. ; Shah, A. ; Catana, A. ; Brunel, M. ; Nguyen, N. V. ; Collins, R. W. ; Carius, R.
Published in
MRS Symp.
Volume
336
Pages
511-516
Date
1994
Note
IMT-NE Number: 166
Laboratories
PV-LAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > PV-LAB - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work outside EPFL
Journal Articles
Published
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work outside EPFL
Journal Articles
Published
Record creation date
2009-02-10