Low-power hermetically sealed on-chip plasma light source micromachined in glass
Carazzetti, P.; Renaud, Philippe; Shea, H. R.
2008
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Abstract

We report on the fabrication and testing of a chip-scale plasma light source. The device consists of a stack of three anodically bonded Pyrex wafers, which hermetically enclose a gas-filled cavity in which electrodes are used to ignite a low power (≪500 mW) RF plasma.

Details

Title Low-power hermetically sealed on-chip plasma light source micromachined in glass
Author(s) Carazzetti, P. ; Renaud, Philippe ; Shea, H. R.
Published in Proceedings of the MEMS’08 Conference
Volume 1
Pages 818-821
Conference MEMS’08
Date 2008
Other identifier(s) View record in Web of Science
Laboratories LMIS4
Record Appears in Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS4 - Microsystems Laboratory 4
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Record creation date 2009-02-02

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