Tunable, high aspect ratio pillars on diverse substrates using copolymer micelle lithography: an interesting platform for applications

We demonstrate the use of copolymer micelle lithography using polystyrene-block-poly(2-vinylpyridine) reverse micelle thin films in their as-coated form to create nanopillars with tunable dimensions and spacing, on different substrates such as silicon, silicon oxide, silicon nitride and quartz. The promise of the approach as a versatile application oriented platform is highlighted by demonstrating its utility for creating super-hydrophobic surfaces, fabrication of nanoporous polymeric membranes, and controlling the areal density of physical vapor deposition derived titanium nitride nanostructures.


Published in:
Nanotechnology, 19, 285301 (6pp)
Year:
2008
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Note: The status of this file is: EPFL only


 Record created 2008-10-02, last modified 2018-03-17

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