000125958 001__ 125958
000125958 005__ 20190604054642.0
000125958 0247_ $$2doi$$a10.1016/j.scriptamat.2008.06.038
000125958 022__ $$a1359-6462
000125958 02470 $$2ISI$$a000259047100024
000125958 037__ $$aARTICLE
000125958 245__ $$aMicrostructure of 5 keV gold-implanted polydimethylsiloxane
000125958 269__ $$a2008
000125958 260__ $$bElsevier$$c2008
000125958 336__ $$aJournal Articles
000125958 520__ $$aThe first high-resolution transmission electron microscopy (TEM) cross-section images of flexible electrodes fabricated by gold ion implantation at 5 keV into polydimethylsiloxane (PDMS) are presented. A TEM sample preparation method based on cryoultramicrotomy, adapted for extremely low-modulus (1 MPa) elastomers, was developed, allowing the gold nanoparticles in a PDMS matrix to be imaged. The cluster size, size distribution and implantation depth of 50 nm were determined from the images and used to calculate the Young’s modulus of the implanted layer.
000125958 6531_ $$aMetal ion implantation; EAP; PDMS; Elasticity of
000125958 6531_ $$ananocomposites; Gold clusters
000125958 700__ $$0242917$$g137877$$aNiklaus, Muhamed
000125958 700__ $$0241188$$g127048$$aRosset, Samuel
000125958 700__ $$aDadras, Massoud
000125958 700__ $$g168661$$aDubois, Phillipe$$0240308
000125958 700__ $$0240376$$g162368$$aHerbert, Shea
000125958 773__ $$j59$$tScripta Materialia$$q893-896
000125958 8564_ $$uhttp://www.scriptamat.org/article/S1359-6462(08)00486-7/abstract$$zURL
000125958 8564_ $$uhttps://infoscience.epfl.ch/record/125958/files/Microstructure%20of%205%20keV%20gold-implanted%20polydimethylsiloxane.pdf$$zn/a$$s469012
000125958 909C0 $$xU10955$$0252107$$pLMTS
000125958 909CO $$ooai:infoscience.tind.io:125958$$qGLOBAL_SET$$pSTI$$particle
000125958 937__ $$aLMTS-ARTICLE-2008-006
000125958 973__ $$rREVIEWED$$sPUBLISHED$$aEPFL
000125958 980__ $$aARTICLE