Novel methods to pattern polymers for microfluidics

We present two novel methods for the preparation of arbitrary microscale patterns of polymers on surfaces with pre-defined topography. While photosensitive polymers are used commonly together with optical lithography, the methods presented can be used for nonphotostructurable polymers and where spin-coating cannot be performed. As demonstrator of the viability of the proposed fabrication process, they have been applied for the definition of hydrophobic barriers on a microfluidics network, which is dedicated to selectively dispense liquid to a spotting device consisting of 12 silicon microcantilevers.


Publié dans:
Microelectronic Engineering, 85, 972-975
Année
2008
Publisher:
Elsevier
ISSN:
0167-9317
Laboratoires:


Note: Le statut de ce fichier est: Seulement EPFL


 Notice créée le 2008-06-25, modifiée le 2018-12-03

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