000125194 001__ 125194
000125194 005__ 20190316234309.0
000125194 0247_ $$2doi$$a10.1016/j.mee.2008.01.052
000125194 022__ $$a0167-9317
000125194 02470 $$2ISI$$a000257413400059
000125194 037__ $$aARTICLE
000125194 245__ $$aNovel methods to pattern polymers for microfluidics
000125194 269__ $$a2008
000125194 260__ $$bElsevier$$c2008
000125194 336__ $$aJournal Articles
000125194 520__ $$aWe present two novel methods for the preparation of arbitrary microscale patterns of polymers on surfaces with pre-defined topography. While photosensitive polymers are used commonly together with optical lithography, the methods presented can be used for nonphotostructurable polymers and where spin-coating cannot be performed. As demonstrator of the viability of the proposed fabrication process, they have been applied for the definition of hydrophobic barriers on a microfluidics network, which is dedicated to selectively dispense liquid to a spotting device consisting of 12 silicon microcantilevers.
000125194 700__ $$aMartin, C.
000125194 700__ $$aLlobera, A.
000125194 700__ $$aLeïchlé, T.
000125194 700__ $$0240380$$aVillanueva, G.$$g176631
000125194 700__ $$aVoigt, A.
000125194 700__ $$0240303$$aFakhfouri, V.$$g129146
000125194 700__ $$0240304$$aKim, J. Y.$$g176598
000125194 700__ $$aBerthet, N.
000125194 700__ $$aBausells, J.
000125194 700__ $$aGruetzner, G.
000125194 700__ $$aNicu, L.
000125194 700__ $$0240120$$aBrugger, J.$$g145781
000125194 700__ $$aPerez-Murano, F.
000125194 773__ $$j85$$q972-975$$tMicroelectronic Engineering
000125194 8564_ $$s674727$$uhttps://infoscience.epfl.ch/record/125194/files/Martin_2008_MicroEng.pdf$$yn/a$$zn/a
000125194 909C0 $$0252546$$pNEMS$$xU12739
000125194 909C0 $$0252040$$pLMIS1$$xU10321
000125194 909CO $$ooai:infoscience.tind.io:125194$$pSTI$$particle$$qGLOBAL_SET
000125194 917Z8 $$x176631
000125194 937__ $$aLMIS1-ARTICLE-2008-037
000125194 973__ $$aOTHER$$rREVIEWED$$sPUBLISHED
000125194 980__ $$aARTICLE