000124742 001__ 124742
000124742 005__ 20190111220531.0
000124742 0247_ $$2doi$$a10.1063/1.2913168
000124742 02470 $$2DAR$$a12361
000124742 02470 $$2ISI$$a000255983200189
000124742 037__ $$aARTICLE
000124742 245__ $$aImpact of feature-size dependent etching on the optical properties of photonic crystal devices
000124742 260__ $$c2008
000124742 269__ $$a2008
000124742 336__ $$aJournal Articles
000124742 520__ $$aFeature size dependence in Ar/Cl2 chemically assisted ion beam etching of    InP-based photonic crystals (PhCs) and its influence on the optical properties of    PhC devices operating in the band gap are investigated. The analysis of the    measured quality factors, the determined mirror reflectivities, and losses of    one-dimensional Fabry–Pérot cavities clearly demonstrates the importance of    feature-size dependent etching. The optical properties show a dramatic    improvement up to a hole depth of about 3.5  µm that is primarily due to a    significant reduction in extrinsic losses. However, beyond this hole depth, the    improvement is at a lower rate, which suggests that extrinsic losses, although    present, are not dominant.
000124742 700__ $$aBerrier, A.
000124742 700__ $$0240343$$aFerrini, R.$$g134470
000124742 700__ $$aTalneau, A.
000124742 700__ $$0240344$$aHoudré, R.$$g105419
000124742 700__ $$aAnand, S.
000124742 773__ $$j103$$k9$$q096106/1-3$$tJournal of Applied Physics
000124742 8564_ $$uhttp://link.aip.org/link/?JAP/103/096106$$zURL
000124742 909C0 $$0252073$$pLOMM$$xU10338
000124742 909C0 $$0253378$$pSCI-SB-RH$$xU13466
000124742 909CO $$ooai:infoscience.tind.io:124742$$pSB$$particle
000124742 937__ $$aLOMM-ARTICLE-2008-007
000124742 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000124742 980__ $$aARTICLE