Application of the shaped electrode technique to a large area rectangular capacitively-coupled plasma reactor to suppress standing wave nonuniformity


Presented at:
AVS 52st Int. Symposium & Exhibition
Year:
2005
Note:
AVS 52st Int. Symposium & Exhibition, Boston, USA, October 30 - November 1, 2005
Laboratories:
SPC
CRPP




 Record created 2008-05-13, last modified 2018-01-28


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