Infoscience

Conference paper

High-rate large-area silicon deposition by VHF plasma

    Note:

    Technical Symposium on CSEM, EPFL & IMT collaboration day, Micro and Nano Technology, Neuchatel, 17 October 2005

    Reference

    • CRPP-CONF-2005-010

    Record created on 2008-05-13, modified on 2016-08-08

Fulltext

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