000124280 001__ 124280
000124280 005__ 20190228220231.0
000124280 037__ $$aCONF
000124280 245__ $$aElimination of electromagnetic non-uniformities in large-area RF plasma reactors used for thin-film deposition
000124280 269__ $$a2004
000124280 260__ $$c2004
000124280 336__ $$aConference Papers
000124280 500__ $$aSociété Suisse de Physique, SPS Annual Meeting, Neuchâtel, 4 mars 2004
000124280 700__ $$0241906$$g105426$$aHowling, A.A.
000124280 700__ $$0240530$$g103532$$aSansonnens, L.
000124280 700__ $$aSchmitt, J.P.M.
000124280 700__ $$0241418$$g131626$$aBallutaud, J.
000124280 700__ $$aSchmidt, H.$$g144320$$0241173
000124280 700__ $$aHollenstein, Ch.$$g105413$$0240129
000124280 7112_ $$aSociété Suisse de Physique
000124280 909C0 $$pCRPP
000124280 909C0 $$0252028$$pSPC
000124280 909CO $$pconf$$pSB$$ooai:infoscience.tind.io:124280
000124280 909C0 $$xU12272$$xU12268$$xU10558$$xU10635$$xU12266$$xU10636$$xU10137$$xU12270$$xU10557$$xU12273$$xU10559$$xU12271$$xU12269$$xU12267$$xU10136
000124280 937__ $$aCRPP-CONF-2004-012
000124280 970__ $$a3659-CONF/CRPP
000124280 973__ $$rREVIEWED$$sPUBLISHED$$aEPFL
000124280 980__ $$aCONF