000124280 001__ 124280
000124280 005__ 20190228220231.0
000124280 037__ $$aCONF
000124280 245__ $$aElimination of electromagnetic non-uniformities in large-area RF plasma reactors used for thin-film deposition
000124280 269__ $$a2004
000124280 260__ $$c2004
000124280 336__ $$aConference Papers
000124280 500__ $$aSociété Suisse de Physique, SPS Annual Meeting, Neuchâtel, 4 mars 2004
000124280 700__ $$0241906$$aHowling, A.A.$$g105426
000124280 700__ $$0240530$$aSansonnens, L.$$g103532
000124280 700__ $$aSchmitt, J.P.M.
000124280 700__ $$0241418$$aBallutaud, J.$$g131626
000124280 700__ $$0241173$$aSchmidt, H.$$g144320
000124280 700__ $$0240129$$aHollenstein, Ch.$$g105413
000124280 7112_ $$aSociété Suisse de Physique
000124280 909C0 $$pCRPP
000124280 909C0 $$0252028$$pSPC$$xU12272$$xU12268$$xU10558$$xU10635$$xU12266$$xU10636$$xU10137$$xU12270$$xU10557$$xU12273$$xU10559$$xU12271$$xU12269$$xU12267$$xU10136
000124280 909CO $$ooai:infoscience.tind.io:124280$$pconf$$pSB
000124280 937__ $$aCRPP-CONF-2004-012
000124280 970__ $$a3659-CONF/CRPP
000124280 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000124280 980__ $$aCONF