Infoscience

Conference paper

Plasma Deposition of p-i-n Devices using a Single PECVD Chamber: Study of the Boron Contamination

    Note:

    Proc. 29th EPS Conference on Controlled Fusion and Plasma Physics, Montreux, Switzerland, June 2002, ECA Vol. 26B (2002) (P-2.029)

    Reference

    • CRPP-CONF-2002-012

    Record created on 2008-05-13, modified on 2016-08-08

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