000124063 001__ 124063
000124063 005__ 20190228220227.0
000124063 037__ $$aCONF
000124063 245__ $$aMechanism of substrate charging after plasma processing
000124063 269__ $$a2001
000124063 260__ $$c2001
000124063 336__ $$aConference Papers
000124063 500__ $$aProc. 15th International Symposium on Plasma Chemistry, Orléans, France, July 2001, Vol. I, 33-39 (2001)
000124063 700__ $$aSchmitt, J.
000124063 700__ $$aBelinger, A.
000124063 700__ $$0240129$$g105413$$aHollenstein, Ch.
000124063 700__ $$0241906$$g105426$$aHowling, A.A.
000124063 700__ $$aPerrin, J.
000124063 700__ $$g103532$$aSansonnens, L.$$0240530
000124063 700__ $$aTurlot, E.
000124063 700__ $$aElyaakoubi, M.
000124063 7112_ $$a15th International Symposium on Plasma Chemistry
000124063 773__ $$jI$$tProc. 15th International Symposium on Plasma Chemistry
000124063 909C0 $$pCRPP
000124063 909C0 $$0252028$$pSPC
000124063 909CO $$pconf$$pSB$$ooai:infoscience.tind.io:124063
000124063 909C0 $$xU12272$$xU12268$$xU10558$$xU10635$$xU12266$$xU10636$$xU10137$$xU12270$$xU10557$$xU12273$$xU10559$$xU12271$$xU12269$$xU12267$$xU10136
000124063 937__ $$aCRPP-CONF-2001-061
000124063 970__ $$a3437-CONF/CRPP
000124063 973__ $$rREVIEWED$$sPUBLISHED$$aEPFL
000124063 980__ $$aCONF