Measurement of substrate charging after plasma processing
2001
Details
Title
Measurement of substrate charging after plasma processing
Author(s)
Howling, A. ; Sansonnens, L. ; Hollenstein, Ch. ; Belinger, A. ; Perrin, J.
Published in
Proc. Frontiers in Low Temperature Plasma Diagnostics IV
Conference
Frontiers in Low Temperature Plasma Diagnostics IV
Date
2001
Note
Proc. Frontiers in Low Temperature Plasma Diagnostics IV, Rolduc, Netherlands, March 2001, p. 230
Laboratories
CRPP
SPC
SPC
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > SPC - Swiss Plasma Center > SPC - Swiss Plasma Center
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Record creation date
2008-05-13