000124033 001__ 124033
000124033 005__ 20190228220227.0
000124033 037__ $$aCONF
000124033 245__ $$aMeasurement of substrate charging after plasma processing
000124033 269__ $$a2001
000124033 260__ $$c2001
000124033 336__ $$aConference Papers
000124033 500__ $$aProc. Frontiers in Low Temperature Plasma Diagnostics IV, Rolduc, Netherlands, March 2001, p. 230
000124033 700__ $$0241906$$g105426$$aHowling, A.
000124033 700__ $$0240530$$g103532$$aSansonnens, L.
000124033 700__ $$g105413$$aHollenstein, Ch.$$0240129
000124033 700__ $$aBelinger, A.
000124033 700__ $$aPerrin, J.
000124033 7112_ $$aFrontiers in Low Temperature Plasma Diagnostics IV
000124033 773__ $$tProc. Frontiers in Low Temperature Plasma Diagnostics IV
000124033 909C0 $$pCRPP
000124033 909C0 $$0252028$$pSPC
000124033 909CO $$pconf$$pSB$$ooai:infoscience.tind.io:124033
000124033 909C0 $$xU12272$$xU12268$$xU10558$$xU10635$$xU12266$$xU10636$$xU10137$$xU12270$$xU10557$$xU12273$$xU10559$$xU12271$$xU12269$$xU12267$$xU10136
000124033 937__ $$aCRPP-CONF-2001-031
000124033 970__ $$a3407-CONF/CRPP
000124033 973__ $$rREVIEWED$$sPUBLISHED$$aEPFL
000124033 980__ $$aCONF