Plasma process control of particulate contamination in amorphous Silicon deposition
1994
Details
Title
Plasma process control of particulate contamination in amorphous Silicon deposition
Author(s)
Courteille, C. ; Sansonnens, L. ; Dutta, J. ; Dorier, J.-L. ; Hollenstein, Ch. ; Howling, A.A. ; Kroll, U.
Published in
Proc. 12 Euro. Photovoltaic Solar Energy Conference
Volume
1
Pages
319-322
Conference
12th EC Photovoltaic Solar Energy Conference, Amsterdam, 12-15 April 1994
Date
1994
Note
IMT-NE Number: 177
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > PV-LAB - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > SB - School of Basic Sciences > SPC - Swiss Plasma Center > SPC - Swiss Plasma Center
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > SB - School of Basic Sciences > SPC - Swiss Plasma Center > SPC - Swiss Plasma Center
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Record creation date
2008-05-13