Plasma deposition of p-i-n devices in a single-chamber larger area PECVC reactor: Reduction of the Boron cross-contamination
2003
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Details
Title
Plasma deposition of p-i-n devices in a single-chamber larger area PECVC reactor: Reduction of the Boron cross-contamination
Author(s)
Ballutaud, J. ; Bucher, C. ; Hollenstein, Ch. ; Howling, A.A. ; Kroll, U. ; Benagli, S. ; Shah, A. ; Buechel, A.
Date
2003
Keywords
Laboratories
CRPP
SPC
SPC
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > SPC - Swiss Plasma Center > SPC - Swiss Plasma Center
Work produced at EPFL
Technical Reports
Published
Work produced at EPFL
Technical Reports
Published
Record creation date
2008-04-18