000121209 001__ 121209
000121209 005__ 20190316234229.0
000121209 037__ $$aREP_WORK
000121209 245__ $$aMicrostructure and growth modes of stoichiometric NiAl and Ni3Al thin films deposited by rf-magnetron sputtering
000121209 269__ $$a2000
000121209 260__ $$c2000
000121209 336__ $$aReports
000121209 6531_ $$aLRP 661
000121209 700__ $$adeAlmeida, P.
000121209 700__ $$0240066$$g109859$$aSchaeublin, R.
000121209 700__ $$aAlmazouzi, A.
000121209 700__ $$0244003$$g106649$$aVictoria, M.
000121209 700__ $$aLevy, F.$$g105661$$0241655
000121209 8564_ $$uhttps://infoscience.epfl.ch/record/121209/files/lrp_661_00_hq.pdf$$zn/a$$s5188558
000121209 909C0 $$pCRPP
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000121209 909CO $$qGLOBAL_SET$$pSB$$preport$$ooai:infoscience.tind.io:121209
000121209 937__ $$aCRPP-REPORT-2000-011
000121209 973__ $$sPUBLISHED$$aEPFL
000121209 980__ $$aREPORT