000121209 001__ 121209
000121209 005__ 20190316234229.0
000121209 037__ $$aREP_WORK
000121209 245__ $$aMicrostructure and growth modes of stoichiometric NiAl and Ni3Al thin films deposited by rf-magnetron sputtering
000121209 269__ $$a2000
000121209 260__ $$c2000
000121209 336__ $$aReports
000121209 6531_ $$aLRP 661
000121209 700__ $$adeAlmeida, P.
000121209 700__ $$0240066$$aSchaeublin, R.$$g109859
000121209 700__ $$aAlmazouzi, A.
000121209 700__ $$0244003$$aVictoria, M.$$g106649
000121209 700__ $$0241655$$aLevy, F.$$g105661
000121209 8564_ $$s5188558$$uhttps://infoscience.epfl.ch/record/121209/files/lrp_661_00_hq.pdf$$zn/a
000121209 909C0 $$pCRPP
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000121209 909CO $$ooai:infoscience.tind.io:121209$$pSB$$preport$$qGLOBAL_SET
000121209 937__ $$aCRPP-REPORT-2000-011
000121209 973__ $$aEPFL$$sPUBLISHED
000121209 980__ $$aREPORT