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Déposition assistée par un plasma à arc à haut courant continu de couches minces de Nitrure de Bore et de Silicium microcristallin hydrogéné
Franz, D.
1999
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Title
Déposition assistée par un plasma à arc à haut courant continu de couches minces de Nitrure de Bore et de Silicium microcristallin hydrogéné
Author(s)
Franz, D.
Date
1999
Keywords
LRP 645
Laboratories
CRPP
SPC
Record Appears in
Scientific production and competences
>
SB - School of Basic Sciences
>
SPC - Swiss Plasma Center
>
SPC - Swiss Plasma Center
Work produced at EPFL
Technical Reports
Published
Record creation date
2008-04-18
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lrp_645_99_hq - n/a