Electrostatic charging: Mechanism of substrate charging after plasma processing
2001
Details
Title
Electrostatic charging: Mechanism of substrate charging after plasma processing
Author(s)
Belinger, A. ; Bulkin, P. ; Delaunay, L. ; Elyaakoubi, M. ; Perrin, J. ; Schmitt, J. ; Turlot, E. ; Hollenstein, Ch. ; Howling, A.A. ; Sansonnens, L.
Published in
Panels (Business & Technical news from Unaxis Displays)
Pages
19-21
Date
2001
Laboratories
CRPP
SPC
SPC
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > SPC - Swiss Plasma Center > SPC - Swiss Plasma Center
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2008-04-16