LF55GN photosensitive flexopolymer: a new material for ultra-thick and high aspect-ratio MEMS fabrication
2007
Details
Title
LF55GN photosensitive flexopolymer: a new material for ultra-thick and high aspect-ratio MEMS fabrication
Author(s)
Sayah, Abdeljalil ; Parashar, Virendra K. ; Gijs, Martin A.M.
Published in
Journal of Microelectromechanical Systems
Volume
16
Pages
564-570
Date
2007
Other identifier(s)
View record in Web of Science
Laboratories
LMIS2
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS2 - Microsystems Laboratory 2
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2008-01-16